Sophisticated Instruments/ Facilities

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Facility
Description
Details
Photolithography

Photolithography is the process of transferring geometric patterns on a mask to the surface of a (silicon) wafer.

Vacuum Thin Film Deposition

Physical Vapor Deposition (PVD) is a vacuum thin-film coating technology that utilizes physical movement of particles in the formation of a thin film.

Probe Station (I-V)

A probe station equipped with microscope and micro-positioner is tool to measure the electrical characteristics of any fabricated device..

Biological Signal Acquisition

The setup is used for biological data acquisition equipped PowerLab data acquisition hardware, 8 channel Octal Bio-and GSR amplifier. The users will be able to learn recording, collection and analysis of physiological signals like ECG, EEG, EMG and GSR using software and systems.

Reactive Ion Etching

Reactive ion etching (RIE) is a type of plasma etch technology used during manufacturing of semiconductor devices.

Plasma-enhanced chemical vapor deposition (PECVD)

Used in developing thin films, PECVD is a technique which is operable at low substrate temperature.

I-V and Quantum Efficiency Measurement

Photovoltaic characterization in terms of external quantum efficiency, and I-V characteristics can be performed.

Milli-Q Water Purification Unit

This is an ion exchange-based water purification unit which is used to deliver neutral water for various purposes.

EDA Tools

The department has Cadence Virtuoso for VLSI circuit simulations, Sentaurus TCAD tool for semiconductor device simulation and modeling, Xilinx suite for VLSI-based modeling of digital circuits/ systems, and Calibre by Mentor Graphics for physical design.

Reach Us

ADDRESS

Head of the Department

Prof. Santanu Sharma
E-mail: hod_ece@tezu.ernet.in
Phone: 03712-275251, 03712-275257

Office

Department of Electronics and Communication Engineering, School of Engineering, Tezpur University, Napaam, Assam, India - 784 028
Phone: +91-03712-275250
Fax:+91-3712-267006