Facility

Description

Details

Photolithography

Photolithography is the process of transferring geometric patterns on a mask to the surface of a (silicon) wafer.

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Vacuum Thin Film Deposition

Physical Vapor Deposition (PVD) is a vacuum thin-film coating technology that utilizes physical movement of particles in the formation of a thin film.

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Probe Station (I-V)

A probe station equipped with microscope and micro-positioner is tool to measure the electrical characteristics of any fabricated device..

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Biological Signal Acquisition

The setup is used for biological data acquisition equipped PowerLab data acquisition hardware, 8 channel Octal Bio-and GSR amplifier. The users will be able to learn recording, collection and analysis of physiological signals like ECG, EEG, EMG and GSR using software and systems.

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Reactive Ion Etching

Reactive ion etching (RIE) is a type of plasma etch technology used during manufacturing of semiconductor devices.

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Plasma-enhanced chemical vapor deposition (PECVD)

Used in developing thin films, PECVD is a technique which is operable at low substrate temperature.

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I-V and Quantum Efficiency Measurement

Photovoltaic characterization in terms of external quantum efficiency, and I-V characteristics can be performed.

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Milli-Q Water Purification Unit

This is an ion exchange-based water purification unit which is used to deliver neutral water for various purposes.

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EDA Tools

The department has Cadence Virtuoso for VLSI circuit simulations, Sentaurus TCAD tool for semiconductor device simulation and modeling, Xilinx suite for VLSI-based modeling of digital circuits/ systems, and Calibre by Mentor Graphics for physical design.

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